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Rutkevych, P. P.
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Rutkevych, P. P.
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Rutkevych, P. P.
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Formation of Ti-Si-N film using low frequency, high density inductively coupled plasma process
by
Rutkevych
,
P
.
P
.
,
Zeng, K. Y.
,
Chen, Z.
,
Chan, L.
,
See, K. H.
,
Law, S. B.
,
Xu, S.
,
Tsakadze, Z. L.
,
Shen, L.
,
Ee, Elden Yong Chiang
Published 2012
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