Surface roughness of FIB sputtered silicon

Surface roughness of FIB sputtered silicon

Mathematical models are developed to calculate the surface roughness of focused-ion-beam (FIB) sputtered surface. The surface roughness is the combination of the beam function and the material function. The beam function includes ion type, acceleration voltage, ion flux, intensity distribution,...

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Bibliographic Details
Main Authors: Ali, Mohammad Yeakub, Hung, N. P., Yuan, S.
Other Authors: Inasaki, Ichiro
Format: Conference or Workshop Item
Language:English
Published: Kluwer Academic Publishers (Springer) 2001
Subjects:
TJ Mechanical engineering and machinery
TS Manufactures
Online Access:http://irep.iium.edu.my/28903/1/surface_of_roughness.pdf
http://irep.iium.edu.my/28903/
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Institution: Universiti Islam Antarabangsa Malaysia
Language: English
Description
Summary:Mathematical models are developed to calculate the surface roughness of focused-ion-beam (FIB) sputtered surface. The surface roughness is the combination of the beam function and the material function. The beam function includes ion type, acceleration voltage, ion flux, intensity distribution, dwell time, etc; the material function includes the inherent material properties related to FIB micromachining. Surface of FIB sputtered (100) silicon was characterized using atomic force microscope. Reasonable agreement between the calculated and measured surface roughness was found.

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