Surface roughness of FIB sputtered silicon
Mathematical models are developed to calculate the surface roughness of focused-ion-beam (FIB) sputtered surface. The surface roughness is the combination of the beam function and the material function. The beam function includes ion type, acceleration voltage, ion flux, intensity distribution,...
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| Language: | English |
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Kluwer Academic Publishers (Springer)
2001
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| Online Access: | http://irep.iium.edu.my/28903/1/surface_of_roughness.pdf http://irep.iium.edu.my/28903/ |
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my.iium.irep.289032013-06-25T05:23:30Z http://irep.iium.edu.my/28903/ Surface roughness of FIB sputtered silicon Ali, Mohammad Yeakub Hung, N. P. Yuan, S. TJ Mechanical engineering and machinery TS Manufactures Mathematical models are developed to calculate the surface roughness of focused-ion-beam (FIB) sputtered surface. The surface roughness is the combination of the beam function and the material function. The beam function includes ion type, acceleration voltage, ion flux, intensity distribution, dwell time, etc; the material function includes the inherent material properties related to FIB micromachining. Surface of FIB sputtered (100) silicon was characterized using atomic force microscope. Reasonable agreement between the calculated and measured surface roughness was found. Kluwer Academic Publishers (Springer) Inasaki, Ichiro 2001 Conference or Workshop Item REM application/pdf en http://irep.iium.edu.my/28903/1/surface_of_roughness.pdf Ali, Mohammad Yeakub and Hung, N. P. and Yuan, S. (2001) Surface roughness of FIB sputtered silicon. In: Precision Engineering at the Beginning of a Millenium (ICPE), 18-20 July 2001, Yokohama, Japan. |
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Universiti Islam Antarabangsa Malaysia |
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Malaysia |
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International Islamic University Malaysia |
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| language |
English |
| topic |
TJ Mechanical engineering and machinery TS Manufactures |
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TJ Mechanical engineering and machinery TS Manufactures Ali, Mohammad Yeakub Hung, N. P. Yuan, S. Surface roughness of FIB sputtered silicon |
| description |
Mathematical models are developed to calculate the surface roughness
of focused-ion-beam (FIB) sputtered surface. The surface roughness is the
combination of the beam function and the material function. The beam
function includes ion type, acceleration voltage, ion flux, intensity
distribution, dwell time, etc; the material function includes the inherent
material properties related to FIB micromachining. Surface of FIB sputtered
(100) silicon was characterized using atomic force microscope. Reasonable
agreement between the calculated and measured surface roughness was
found. |
| author2 |
Inasaki, Ichiro |
| author_facet |
Inasaki, Ichiro Ali, Mohammad Yeakub Hung, N. P. Yuan, S. |
| format |
Conference or Workshop Item |
| author |
Ali, Mohammad Yeakub Hung, N. P. Yuan, S. |
| author_sort |
Ali, Mohammad Yeakub |
| title |
Surface roughness of FIB sputtered silicon |
| title_short |
Surface roughness of FIB sputtered silicon |
| title_full |
Surface roughness of FIB sputtered silicon |
| title_fullStr |
Surface roughness of FIB sputtered silicon |
| title_full_unstemmed |
Surface roughness of FIB sputtered silicon |
| title_sort |
surface roughness of fib sputtered silicon |
| publisher |
Kluwer Academic Publishers (Springer) |
| publishDate |
2001 |
| url |
http://irep.iium.edu.my/28903/1/surface_of_roughness.pdf http://irep.iium.edu.my/28903/ |
| _version_ |
1643609571617406976 |