Wettability analysis on platinum deposited wafer after reactive ion ecthing using SF6+argon/CF4+argon gaseous

Wettability analysis on platinum deposited wafer after reactive ion ecthing using SF6+argon/CF4+argon gaseous

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Bibliographic Details
Main Authors: Retnasamy, Vithyacharan, Zaliman, Sauli, Dr., Aaron, Koay Terr Yeow, Goh, Siew Chui, Kamarudin, Hussin, Brig. Jen. Dato' Prof. Dr.
Other Authors: vc.sundress@gmail.com
Format: Article
Language:English
Published: AENSI Publisher All rights reserved 2014
Subjects:
Contact angle
DOE
Platinum
RIE
Wetability
Online Access:http://dspace.unimap.edu.my:80/dspace/handle/123456789/35122
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Institution: Universiti Malaysia Perlis
Language: English
Description
Summary:Link to publisher's homepage at http://www.aensiweb.com/

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