Fabrication and characterisation of resistive nanocrystalline graphite

• Main Authors: Sultan, S. M., Pu, S. H., Fishlock, S. J., Chong, H. M. H., Wah, L. H., McBride, J. W.
• Format: Conference or Workshop Item
• Language: English
• Published: 2021
• Subjects: TK Electrical engineering. Electronics Nuclear engineering
• Online Access: http://eprints.utm.my/id/eprint/95958/1/SMSultan2021_FabricationandCharacterisation.pdf; http://eprints.utm.my/id/eprint/95958/; http://dx.doi.org/10.1109/RSM52397.2021.9511601
• Institution: Universiti Teknologi Malaysia

This work demonstrates the feasibility of fabricating resistive nanocrystalline graphite (NCG) on a Si substrate. The NCG film thickness of 9 nm was deposited using metal-free plasma enhanced chemical vapour deposition (PECVD) on a 6-inch p-type silicon wafer. The surface and electrical properties o...