Etching-free patterning method for electrical characterization of atomically thin MoSe2 films grown by chemical vapor deposition

• المؤلفون الرئيسيون: Utama, Muhammad Iqbal Bakti, Lu, Xin, Zhan, Da, Ha, Son Tung, Yuan, Yanwen, Shen, Zexiang, Xiong, Qihua
• مؤلفون آخرون: School of Electrical and Electronic Engineering
• التنسيق: مقال
• اللغة: English
• منشور في: 2015
• الموضوعات: DRNTU::Science::Physics
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/100276; http://hdl.handle.net/10220/25679
• المؤسسة: Nanyang Technological University

Patterning two-dimensional materials into specific spatial arrangements and geometries is essential for both fundamental studies of materials and practical applications in electronics. However, the currently available patterning methods generally require etching steps that rely on complicated and ex...