Etching-free patterning method for electrical characterization of atomically thin MoSe2 films grown by chemical vapor deposition

• Main Authors: Utama, Muhammad Iqbal Bakti, Lu, Xin, Zhan, Da, Ha, Son Tung, Yuan, Yanwen, Shen, Zexiang, Xiong, Qihua
• 其他作者: School of Electrical and Electronic Engineering
• 格式: Article
• 語言: English
• 出版: 2015
• 主題: DRNTU::Science::Physics
• 在線閱讀: https://hdl.handle.net/10356/100276; http://hdl.handle.net/10220/25679

Patterning two-dimensional materials into specific spatial arrangements and geometries is essential for both fundamental studies of materials and practical applications in electronics. However, the currently available patterning methods generally require etching steps that rely on complicated and ex...