Growth of p-type GaAs∕AlGaAs(111) quantum well infrared photodetector using solid source molecular-beam epitaxy

A p-type GaAs/AlGaAs multi-quantum-well infrared photodetector(QWIP) was fabricated on a GaAs (111)A substrate by molecular-beam epitaxy using silicon as dopant. The same structure was also grown on a GaAs (100) wafer simultaneously to compare the material and structural properties. It was found tha...

全面介紹

Saved in:
書目詳細資料
Main Authors: Li, H., Mei, T., Karunasiri, G., Yuan, K. H., Fan, Weijun, Zhang, Dao Hua, Yoon, Soon Fatt
其他作者: School of Electrical and Electronic Engineering
格式: Article
語言:English
出版: 2013
主題:
在線閱讀:https://hdl.handle.net/10356/100687
http://hdl.handle.net/10220/18030
標簽: 添加標簽
沒有標簽, 成為第一個標記此記錄!