Tse, M. S., Tay, J. H., Wong, F. S., & Engineering, S. o. E. a. E. (2008). Application of supercritical CO2 for wafer processing steps.
استشهاد بنمط شيكاغوTse, Man Siu., Joo Hwa Tay, Fook Sin Wong, و School of Electrical and Electronic Engineering. Application of Supercritical CO2 for Wafer Processing Steps. 2008.
MLA استشهادTse, Man Siu., Joo Hwa Tay, Fook Sin Wong, و School of Electrical and Electronic Engineering. Application of Supercritical CO2 for Wafer Processing Steps. 2008.
تحذير: قد لا تكون هذه الاستشهادات دائما دقيقة بنسبة 100%.