Nanoindentation behavior in T-carbon thin films: a molecular dynamics study

• المؤلفون الرئيسيون: Zhou, Runhua, Huang, Changjin, Srikanth, Narasimalu, Bai, Lichun, Wu, Mao See
• مؤلفون آخرون: School of Mechanical and Aerospace Engineering
• التنسيق: مقال
• اللغة: English
• منشور في: 2025
• الموضوعات: Engineering; Hardening mechanisms; Molecular dynamics
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/182480
• المؤسسة: Nanyang Technological University

T-carbon is a new allotrope of carbon materials, and it displays high hardness and low density. Nevertheless, the hardening mechanisms of T-carbon thin films under nanoindentation remain elusive. This work utilizes molecular dynamics simulation to explore the hardening mechanisms of T-carbon thin fi...