APA引文

Lu, Y., & Weiguang, Z. (2008). High-k hafnium oxide based thin films using laser molecular beam epitaxy for gate dielectrics.

Chicago Style Citation

Lu, Yuekang, and Zhu Weiguang. High-k Hafnium Oxide Based Thin Films Using Laser Molecular Beam Epitaxy for Gate Dielectrics. 2008.

MLA引文

Lu, Yuekang, and Zhu Weiguang. High-k Hafnium Oxide Based Thin Films Using Laser Molecular Beam Epitaxy for Gate Dielectrics. 2008.

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