Development of silicon carbide thin films for optoelectronic device applications

In this project, the electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique has been used to deposit amorphous (a-SiC:H) and microcrystalline (mc-SiC3-I) films for characterisation of their optical, electrical and structural properties using transmittance/reflectance measuremen...

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書目詳細資料
主要作者: Ji, Rong
其他作者: Yoon, Soon Fatt
格式: Theses and Dissertations
出版: 2008
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在線閱讀:http://hdl.handle.net/10356/4461
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