Study of electrochromic materials using physical vapor deposition
Electrochromic thin films (Molybdenum oxide and Nickel Oxide) have been deposited using physical vapor deposition technique at room temperature. The first phase of this project focuses on the deposition of these electrochromic thin films on ITO glass and borosilicate glass. During optimization of th...
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| 格式: | Final Year Project |
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2016
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sg-ntu-dr.10356-663592023-03-04T15:35:57Z Study of electrochromic materials using physical vapor deposition Toh, Jia Sheng Lu Xuehong School of Materials Science and Engineering A*STAR Institute of Material Research and Engineering Dr Nancy Wong Lai Mun DRNTU::Science Electrochromic thin films (Molybdenum oxide and Nickel Oxide) have been deposited using physical vapor deposition technique at room temperature. The first phase of this project focuses on the deposition of these electrochromic thin films on ITO glass and borosilicate glass. During optimization of these films, several parameters are varied such as oxygen flow rate, argon flow rate, oxygen partial pressure, deposition duration and duration for exposure of argon and oxygen prior to sputtering. The second phase of this project focuses on the characterization of these electrochromic films. The optical property, surface morphology and electrochromic property were investigated using spectrophotometry, atomic force microscopy and cyclic voltammetry. Bachelor of Engineering 2016-03-30T04:15:49Z 2016-03-30T04:15:49Z 2016 Final Year Project (FYP) http://hdl.handle.net/10356/66359 en Nanyang Technological University 50 p. application/pdf |
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DRNTU::Science Toh, Jia Sheng Study of electrochromic materials using physical vapor deposition |
| description |
Electrochromic thin films (Molybdenum oxide and Nickel Oxide) have been deposited using physical vapor deposition technique at room temperature. The first phase of this project focuses on the deposition of these electrochromic thin films on ITO glass and borosilicate glass. During optimization of these films, several parameters are varied such as oxygen flow rate, argon flow rate, oxygen partial pressure, deposition duration and duration for exposure of argon and oxygen prior to sputtering. The second phase of this project focuses on the characterization of these electrochromic films. The optical property, surface morphology and electrochromic property were investigated using spectrophotometry, atomic force microscopy and cyclic voltammetry. |
| author2 |
Lu Xuehong |
| author_facet |
Lu Xuehong Toh, Jia Sheng |
| format |
Final Year Project |
| author |
Toh, Jia Sheng |
| author_sort |
Toh, Jia Sheng |
| title |
Study of electrochromic materials using physical vapor deposition |
| title_short |
Study of electrochromic materials using physical vapor deposition |
| title_full |
Study of electrochromic materials using physical vapor deposition |
| title_fullStr |
Study of electrochromic materials using physical vapor deposition |
| title_full_unstemmed |
Study of electrochromic materials using physical vapor deposition |
| title_sort |
study of electrochromic materials using physical vapor deposition |
| publishDate |
2016 |
| url |
http://hdl.handle.net/10356/66359 |
| _version_ |
1759855617129840640 |