APA استشهاد

Karuturi, S. K., Liu, L., Su, L. T., Zhao, Y., Fan, H. J., Ge, X., . . . Engineering, S. o. M. S. &. (2011). Kinetics of stop-flow atomic layer deposition for high aspect ratio template filling through photonic band gap measurements.

استشهاد بنمط شيكاغو

Karuturi, Siva Krishna, Lijun Liu, Liap Tat Su, Yang Zhao, Hong Jin Fan, Xiaochen Ge, Sailing He, Alfred Iing Yoong Tok, و School of Materials Science & Engineering. Kinetics of Stop-flow Atomic Layer Deposition for High Aspect Ratio Template Filling Through Photonic Band Gap Measurements. 2011.

MLA استشهاد

Karuturi, Siva Krishna, et al. Kinetics of Stop-flow Atomic Layer Deposition for High Aspect Ratio Template Filling Through Photonic Band Gap Measurements. 2011.

تحذير: قد لا تكون هذه الاستشهادات دائما دقيقة بنسبة 100%.