Shao, W., Chen, Z., Tu, K. N., Gusak, A. M., Gan, Z., Mhaisalkar, S. G., . . . Engineering, S. o. M. S. &. (2012). Reservoir effect and the role of low current density regions on electromigration lifetimes in copper interconnects.

Shao, W., Z. Chen, K. N. Tu, A. M. Gusak, Zhenghao Gan, Subodh Gautam Mhaisalkar, Hong Yu Li, و School of Materials Science & Engineering. Reservoir Effect and the Role of Low Current Density Regions On Electromigration Lifetimes in Copper Interconnects. 2012.

Shao, W., et al. Reservoir Effect and the Role of Low Current Density Regions On Electromigration Lifetimes in Copper Interconnects. 2012.