APA引文

Shao, W., Chen, Z., Tu, K. N., Gusak, A. M., Gan, Z., Mhaisalkar, S. G., . . . Engineering, S. o. M. S. &. (2012). Reservoir effect and the role of low current density regions on electromigration lifetimes in copper interconnects.

Chicago Style Citation

Shao, W., Z. Chen, K. N. Tu, A. M. Gusak, Zhenghao Gan, Subodh Gautam Mhaisalkar, Hong Yu Li, and School of Materials Science & Engineering. Reservoir Effect and the Role of Low Current Density Regions On Electromigration Lifetimes in Copper Interconnects. 2012.

MLA引文

Shao, W., et al. Reservoir Effect and the Role of Low Current Density Regions On Electromigration Lifetimes in Copper Interconnects. 2012.