APA استشهاد

Loh, S., Zhang, D., Liu, R., Li, C., Wee, A., & SCIENCE, I. O. E. (2014). Investigation of metal-organic chemical vapor deposited copper diffusion in tantalum after annealing.

استشهاد بنمط شيكاغو

Loh, S.W., D.H Zhang, R. Liu, C.Y Li, A.T.S Wee, و INSTITUTE OF ENGINEERING SCIENCE. Investigation of Metal-organic Chemical Vapor Deposited Copper Diffusion in Tantalum After Annealing. 2014.

MLA استشهاد

Loh, S.W., et al. Investigation of Metal-organic Chemical Vapor Deposited Copper Diffusion in Tantalum After Annealing. 2014.

تحذير: قد لا تكون هذه الاستشهادات دائما دقيقة بنسبة 100%.