JIANLING, C., & SCIENCE, M. (2010). Effects of Cu: Al ratios and SiO2 substrates on PE-MOCVD copper aluminium oxide semiconductor thin films.
Chicago Style CitationJIANLING, CAI, and MATERIALS SCIENCE. Effects of Cu: Al Ratios and SiO2 Substrates On PE-MOCVD Copper Aluminium Oxide Semiconductor Thin Films. 2010.
MLA引文JIANLING, CAI, and MATERIALS SCIENCE. Effects of Cu: Al Ratios and SiO2 Substrates On PE-MOCVD Copper Aluminium Oxide Semiconductor Thin Films. 2010.
警告:這些引文格式不一定是100%准確.