Text this: STUDY OF PROCESS IMPACT ON K VALUE OF LOW K DIELECTRIC MATERIAL USED IN CU / LOW K DUAL DAMASCENE INTERCONNECT

  ______     ___      _  __     ___      ____    
 /_   _//   / _ \\   | |/ //   / _ \\   |  _ \\  
   | ||    / //\ \\  | ' //   | / \ ||  | |_| || 
  _| ||   |  ___  || | . \\   | \_/ ||  | .  //  
 /__//    |_||  |_|| |_|\_\\   \___//   |_|\_\\  
 `--`     `-`   `-`  `-` --`   `---`    `-` --`