POON CHYIU HYIA, D., & ENGINEERING, E. &. C. (2010). Ultrashallow junction formation for next generation MOS technology.
استشهاد بنمط شيكاغوPOON CHYIU HYIA, DEBORA, و ELECTRICAL & COMPUTER ENGINEERING. Ultrashallow Junction Formation for Next Generation MOS Technology. 2010.
MLA استشهادPOON CHYIU HYIA, DEBORA, و ELECTRICAL & COMPUTER ENGINEERING. Ultrashallow Junction Formation for Next Generation MOS Technology. 2010.
تحذير: قد لا تكون هذه الاستشهادات دائما دقيقة بنسبة 100%.