Ma, H., Zeng, S., Annadi, A., Huang, Z., Venkatesan, T., Ariando, N., & ENGINEERING, E. A. C. (2020). Tuning the conductivity threshold and carrier density of two-dimensional electron gas at oxide interfaces through interface engineering.
Chicago Style CitationMa, H.J.H, S.W Zeng, A. Annadi, Z. Huang, T. Venkatesan, NUSNNI-Nanocore Ariando, and ELECTRICAL AND COMPUTER ENGINEERING. Tuning the Conductivity Threshold and Carrier Density of Two-dimensional Electron Gas At Oxide Interfaces Through Interface Engineering. 2020.
MLA引文Ma, H.J.H, et al. Tuning the Conductivity Threshold and Carrier Density of Two-dimensional Electron Gas At Oxide Interfaces Through Interface Engineering. 2020.
警告:這些引文格式不一定是100%准確.