Hwang, W., Cho, B., Chan, D., Lee, S., Yoo, W., & ENGINEERING, E. &. C. (2014). Effects of volatility of etch by-products on surface roughness during etching of metal gates in Cl2.

Hwang, W.S., B.-J Cho, D.S.H Chan, S.W Lee, W.J Yoo, and ELECTRICAL & COMPUTER ENGINEERING. Effects of Volatility of Etch By-products On Surface Roughness During Etching of Metal Gates in Cl2. 2014.

Hwang, W.S., et al. Effects of Volatility of Etch By-products On Surface Roughness During Etching of Metal Gates in Cl2. 2014.