Xu, M., Tan, C., Li, M., & ENGINEERING, E. &. C. (2014). Extended Arrhenius law of time-to-breakdown of ultrathin gate oxides.
استشهاد بنمط شيكاغوXu, M., C. Tan, M. Li, و ELECTRICAL & COMPUTER ENGINEERING. Extended Arrhenius Law of Time-to-breakdown of Ultrathin Gate Oxides. 2014.
MLA استشهادXu, M., C. Tan, M. Li, و ELECTRICAL & COMPUTER ENGINEERING. Extended Arrhenius Law of Time-to-breakdown of Ultrathin Gate Oxides. 2014.
تحذير: قد لا تكون هذه الاستشهادات دائما دقيقة بنسبة 100%.