Cho, B., Kim, S., Ang, C., Ling, C., Joo, M., Yeo, I., & ENGINEERING, E. &. C. (2014). Reliability of thin gate oxides irradiated under X-ray lithography conditions.
استشهاد بنمط شيكاغوCho, B.J., S.J Kim, C.H Ang, C.H Ling, M.S Joo, I.S Yeo, و ELECTRICAL & COMPUTER ENGINEERING. Reliability of Thin Gate Oxides Irradiated Under X-ray Lithography Conditions. 2014.
MLA استشهادCho, B.J., et al. Reliability of Thin Gate Oxides Irradiated Under X-ray Lithography Conditions. 2014.
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