Wang, X., Li, M., Yu, H., Yang, J., Chen, J., Zhu, C., . . . ENGINEERING, E. &. C. (2014). Widely tunable work function TaN/Ru stacking layer on HfLaO gate dielectric.
Chicago Style CitationWang, X.P., et al. Widely Tunable Work Function TaN/Ru Stacking Layer On HfLaO Gate Dielectric. 2014.
MLA引文Wang, X.P., et al. Widely Tunable Work Function TaN/Ru Stacking Layer On HfLaO Gate Dielectric. 2014.
警告：這些引文格式不一定是100％准確.