أرسل هذا في رسالة قصيرة: SILICON NITRIDE FILMS PREPARED BY PLASMA-ENHANCED CHEMICAL VAPOUR DEPOSITION (PECVD) OF SiH//4/NH//3/N//2 MIXTURES: SOME PHYSICAL PROPERTIES.

  _____     ______   ______      ___     _____    
 |__  //   /_   _// |      \\   / _ \\  |  __ \\  
   / //     -| ||-  |  --  //  | / \ || | |  \ || 
  / //__    _| ||_  |  --  \\  | \_/ || | |__/ || 
 /_____||  /_____// |______//   \___//  |_____//  
 `-----`   `-----`  `------`    `---`    -----`