Some recent developments of polyhedral oligomeric silsesquioxane (POSS)-based polymeric materials

Some recent developments of polyhedral oligomeric silsesquioxane (POSS)-based polymeric materials

Journal of Materials Chemistry

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Bibliographic Details
Main Authors: Wang, F., Lu, X., He, C.
Other Authors: MATERIALS SCIENCE AND ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/65003
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Institution: National University of Singapore
Description
Summary:Journal of Materials Chemistry

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