Hong, M., Lu, Y., Ho, T., Lu, L., Low, T., & ENGINEERING, E. (2014). Fast ICCD imaging of KrF excimer laser induced titanium plasma plumes for silicon metallization.
Chicago Style CitationHong, M.H., Y.F Lu, T.M Ho, L.W Lu, T.S Low, and ELECTRICAL ENGINEERING. Fast ICCD Imaging of KrF Excimer Laser Induced Titanium Plasma Plumes for Silicon Metallization. 2014.
MLA引文Hong, M.H., et al. Fast ICCD Imaging of KrF Excimer Laser Induced Titanium Plasma Plumes for Silicon Metallization. 2014.
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