Hong, M., Lu, Y., Ho, T., Lu, L., Low, T., & ENGINEERING, E. (2014). Fast ICCD imaging of KrF excimer laser induced titanium plasma plumes for silicon metallization.
استشهاد بنمط شيكاغوHong, M.H., Y.F Lu, T.M Ho, L.W Lu, T.S Low, و ELECTRICAL ENGINEERING. Fast ICCD Imaging of KrF Excimer Laser Induced Titanium Plasma Plumes for Silicon Metallization. 2014.
MLA استشهادHong, M.H., et al. Fast ICCD Imaging of KrF Excimer Laser Induced Titanium Plasma Plumes for Silicon Metallization. 2014.
تحذير: قد لا تكون هذه الاستشهادات دائما دقيقة بنسبة 100%.