發送短信 : Formation of voids in Ti-salicided BF+ 2-doped submicron polysilicon lines

  _  __   _    _   __    __    _____    _____    
 | |/ // | || | || \ \\ / //  |  ___|| |  __ \\  
 | ' //  | || | ||  \ \/ //   | ||__   | |  \ || 
 | . \\  | \\_/ ||   \  //    | ||__   | |__/ || 
 |_|\_\\  \____//     \//     |_____|| |_____//  
 `-` --`   `---`       `      `-----`   -----`