Ang, C., Ling, C., Cho, B., Kim, S., Cheng, Z., & ENGINEERING, E. (2014). Radiation and electrical stress-induced hole trap-assisted tunneling currents in ultrathin gate oxides.
استشهاد بنمط شيكاغوAng, C.-H., C.-H Ling, B.-J Cho, S.-J Kim, Z.-Y Cheng, و ELECTRICAL ENGINEERING. Radiation and Electrical Stress-induced Hole Trap-assisted Tunneling Currents in Ultrathin Gate Oxides. 2014.
MLA استشهادAng, C.-H., et al. Radiation and Electrical Stress-induced Hole Trap-assisted Tunneling Currents in Ultrathin Gate Oxides. 2014.
تحذير: قد لا تكون هذه الاستشهادات دائما دقيقة بنسبة 100%.