Experimental evidence of two conduction mechanisms for direct tunnelling stress-induced leakage current through ultrathin silicon dioxide gate dielectrics

10.1088/0268-1242/21/10/004

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Main Authors: Samanta, P., Man, T.Y., Chan, A.C.K., Zhang, Q., Zhu, C., Chan, M.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82322
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spelling sg-nus-scholar.10635-823222023-10-27T07:29:42Z Experimental evidence of two conduction mechanisms for direct tunnelling stress-induced leakage current through ultrathin silicon dioxide gate dielectrics Samanta, P. Man, T.Y. Chan, A.C.K. Zhang, Q. Zhu, C. Chan, M. ELECTRICAL & COMPUTER ENGINEERING 10.1088/0268-1242/21/10/004 Semiconductor Science and Technology 21 10 1393-1401 SSTEE 2014-10-07T04:28:00Z 2014-10-07T04:28:00Z 2006-10-10 Article Samanta, P., Man, T.Y., Chan, A.C.K., Zhang, Q., Zhu, C., Chan, M. (2006-10-10). Experimental evidence of two conduction mechanisms for direct tunnelling stress-induced leakage current through ultrathin silicon dioxide gate dielectrics. Semiconductor Science and Technology 21 (10) : 1393-1401. ScholarBank@NUS Repository. https://doi.org/10.1088/0268-1242/21/10/004 02681242 http://scholarbank.nus.edu.sg/handle/10635/82322 000242578100004 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1088/0268-1242/21/10/004
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Samanta, P.
Man, T.Y.
Chan, A.C.K.
Zhang, Q.
Zhu, C.
Chan, M.
format Article
author Samanta, P.
Man, T.Y.
Chan, A.C.K.
Zhang, Q.
Zhu, C.
Chan, M.
spellingShingle Samanta, P.
Man, T.Y.
Chan, A.C.K.
Zhang, Q.
Zhu, C.
Chan, M.
Experimental evidence of two conduction mechanisms for direct tunnelling stress-induced leakage current through ultrathin silicon dioxide gate dielectrics
author_sort Samanta, P.
title Experimental evidence of two conduction mechanisms for direct tunnelling stress-induced leakage current through ultrathin silicon dioxide gate dielectrics
title_short Experimental evidence of two conduction mechanisms for direct tunnelling stress-induced leakage current through ultrathin silicon dioxide gate dielectrics
title_full Experimental evidence of two conduction mechanisms for direct tunnelling stress-induced leakage current through ultrathin silicon dioxide gate dielectrics
title_fullStr Experimental evidence of two conduction mechanisms for direct tunnelling stress-induced leakage current through ultrathin silicon dioxide gate dielectrics
title_full_unstemmed Experimental evidence of two conduction mechanisms for direct tunnelling stress-induced leakage current through ultrathin silicon dioxide gate dielectrics
title_sort experimental evidence of two conduction mechanisms for direct tunnelling stress-induced leakage current through ultrathin silicon dioxide gate dielectrics
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/82322
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