Experimental evidence of two conduction mechanisms for direct tunnelling stress-induced leakage current through ultrathin silicon dioxide gate dielectrics
10.1088/0268-1242/21/10/004
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sg-nus-scholar.10635-823222023-10-27T07:29:42Z Experimental evidence of two conduction mechanisms for direct tunnelling stress-induced leakage current through ultrathin silicon dioxide gate dielectrics Samanta, P. Man, T.Y. Chan, A.C.K. Zhang, Q. Zhu, C. Chan, M. ELECTRICAL & COMPUTER ENGINEERING 10.1088/0268-1242/21/10/004 Semiconductor Science and Technology 21 10 1393-1401 SSTEE 2014-10-07T04:28:00Z 2014-10-07T04:28:00Z 2006-10-10 Article Samanta, P., Man, T.Y., Chan, A.C.K., Zhang, Q., Zhu, C., Chan, M. (2006-10-10). Experimental evidence of two conduction mechanisms for direct tunnelling stress-induced leakage current through ultrathin silicon dioxide gate dielectrics. Semiconductor Science and Technology 21 (10) : 1393-1401. ScholarBank@NUS Repository. https://doi.org/10.1088/0268-1242/21/10/004 02681242 http://scholarbank.nus.edu.sg/handle/10635/82322 000242578100004 Scopus |
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10.1088/0268-1242/21/10/004 |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Samanta, P. Man, T.Y. Chan, A.C.K. Zhang, Q. Zhu, C. Chan, M. |
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Samanta, P. Man, T.Y. Chan, A.C.K. Zhang, Q. Zhu, C. Chan, M. |
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Samanta, P. Man, T.Y. Chan, A.C.K. Zhang, Q. Zhu, C. Chan, M. Experimental evidence of two conduction mechanisms for direct tunnelling stress-induced leakage current through ultrathin silicon dioxide gate dielectrics |
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Samanta, P. |
title |
Experimental evidence of two conduction mechanisms for direct tunnelling stress-induced leakage current through ultrathin silicon dioxide gate dielectrics |
title_short |
Experimental evidence of two conduction mechanisms for direct tunnelling stress-induced leakage current through ultrathin silicon dioxide gate dielectrics |
title_full |
Experimental evidence of two conduction mechanisms for direct tunnelling stress-induced leakage current through ultrathin silicon dioxide gate dielectrics |
title_fullStr |
Experimental evidence of two conduction mechanisms for direct tunnelling stress-induced leakage current through ultrathin silicon dioxide gate dielectrics |
title_full_unstemmed |
Experimental evidence of two conduction mechanisms for direct tunnelling stress-induced leakage current through ultrathin silicon dioxide gate dielectrics |
title_sort |
experimental evidence of two conduction mechanisms for direct tunnelling stress-induced leakage current through ultrathin silicon dioxide gate dielectrics |
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2014 |
url |
http://scholarbank.nus.edu.sg/handle/10635/82322 |
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1781784108569985024 |