Gupta, R., Yoo, W., Wang, Y., Tan, Z., Samudra, G., Lee, S., . . . ENGINEERING, E. &. C. (2014). Formation of sige nanocrystals in HfO 2 using in situ chemical vapor deposition for memory applications.
Chicago Style CitationGupta, R., et al. Formation of Sige Nanocrystals in HfO 2 Using in Situ Chemical Vapor Deposition for Memory Applications. 2014.
MLA引文Gupta, R., et al. Formation of Sige Nanocrystals in HfO 2 Using in Situ Chemical Vapor Deposition for Memory Applications. 2014.
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