Rapid thermal oxidation of Ge-rich Si1-xGex heterolayers

10.1116/1.2137329

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Main Authors: Bera, M.K., Chakraborty, S., Das, R., Dalapati, G.K., Chattopadhyay, S., Samanta, S.K., Yoo, W.J., Chakraborty, A.K., Butenko, Y., Šiller, L., Hunt, M.R.C., Saha, S., Maiti, C.K.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82967
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spelling sg-nus-scholar.10635-829672023-10-29T22:24:34Z Rapid thermal oxidation of Ge-rich Si1-xGex heterolayers Bera, M.K. Chakraborty, S. Das, R. Dalapati, G.K. Chattopadhyay, S. Samanta, S.K. Yoo, W.J. Chakraborty, A.K. Butenko, Y. Šiller, L. Hunt, M.R.C. Saha, S. Maiti, C.K. ELECTRICAL & COMPUTER ENGINEERING 10.1116/1.2137329 Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 24 1 84-90 JVTAD 2014-10-07T04:35:38Z 2014-10-07T04:35:38Z 2006-01 Article Bera, M.K., Chakraborty, S., Das, R., Dalapati, G.K., Chattopadhyay, S., Samanta, S.K., Yoo, W.J., Chakraborty, A.K., Butenko, Y., Šiller, L., Hunt, M.R.C., Saha, S., Maiti, C.K. (2006-01). Rapid thermal oxidation of Ge-rich Si1-xGex heterolayers. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 24 (1) : 84-90. ScholarBank@NUS Repository. https://doi.org/10.1116/1.2137329 07342101 http://scholarbank.nus.edu.sg/handle/10635/82967 000234814100013 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1116/1.2137329
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Bera, M.K.
Chakraborty, S.
Das, R.
Dalapati, G.K.
Chattopadhyay, S.
Samanta, S.K.
Yoo, W.J.
Chakraborty, A.K.
Butenko, Y.
Šiller, L.
Hunt, M.R.C.
Saha, S.
Maiti, C.K.
format Article
author Bera, M.K.
Chakraborty, S.
Das, R.
Dalapati, G.K.
Chattopadhyay, S.
Samanta, S.K.
Yoo, W.J.
Chakraborty, A.K.
Butenko, Y.
Šiller, L.
Hunt, M.R.C.
Saha, S.
Maiti, C.K.
spellingShingle Bera, M.K.
Chakraborty, S.
Das, R.
Dalapati, G.K.
Chattopadhyay, S.
Samanta, S.K.
Yoo, W.J.
Chakraborty, A.K.
Butenko, Y.
Šiller, L.
Hunt, M.R.C.
Saha, S.
Maiti, C.K.
Rapid thermal oxidation of Ge-rich Si1-xGex heterolayers
author_sort Bera, M.K.
title Rapid thermal oxidation of Ge-rich Si1-xGex heterolayers
title_short Rapid thermal oxidation of Ge-rich Si1-xGex heterolayers
title_full Rapid thermal oxidation of Ge-rich Si1-xGex heterolayers
title_fullStr Rapid thermal oxidation of Ge-rich Si1-xGex heterolayers
title_full_unstemmed Rapid thermal oxidation of Ge-rich Si1-xGex heterolayers
title_sort rapid thermal oxidation of ge-rich si1-xgex heterolayers
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/82967
_version_ 1781784262746308608