Text this: Source/drain engineering for In0.7Ga0.3As N-channel metal-oxide-semiconductor field-effect transistors. Raised source/drain with in situ doping for series resistance reduction

__    __     ___      ______    _____     ______  
\ \\ / //   / _ \\   /_   _//  |  ___||  /_____// 
 \ \/ //   | / \ ||    | ||    | ||__    `____ `  
  \  //    | \_/ ||   _| ||    | ||__    /___//   
   \//      \___//   /__//     |_____||  `__ `    
    `       `---`    `--`      `-----`   /_//     
                                         `-`