Text this: Source/drain engineering for In0.7Ga0.3As N-channel metal-oxide-semiconductor field-effect transistors. Raised source/drain with in situ doping for series resistance reduction

   _____    _____   __    __   __   __   ______   
  / ___//  |  ___|| \ \\ / //  \ \\/ // |      \\ 
  \___ \\  | ||__    \ \/ //    \ ` //  |  --  // 
  /    //  | ||__     \  //      | ||   |  --  \\ 
 /____//   |_____||    \//       |_||   |______// 
`-----`    `-----`      `        `-`'   `------`