Tunable stress and controlled thickness modification in graphene by annealing
10.1021/nn800031m
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Main Authors: | Ni, Z.H., Wang, H.M., Ma, Y., Kasim, J., Wu, Y.H., Shen, Z.X. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Article |
Published: |
2014
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Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/83223 |
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Institution: | National University of Singapore |
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