Yan, F., Zhu, T., Lai, M., Lu, L., & ENGINEERING, M. (2014). Influence of oxygen pressure on the ferroelectric properties of BiFeO 3 thin films on LaNiO3/Si substrates via laser ablation.
استشهاد بنمط شيكاغوYan, F., T.J Zhu, M.O Lai, L. Lu, و MECHANICAL ENGINEERING. Influence of Oxygen Pressure On the Ferroelectric Properties of BiFeO 3 Thin Films On LaNiO3/Si Substrates Via Laser Ablation. 2014.
MLA استشهادYan, F., et al. Influence of Oxygen Pressure On the Ferroelectric Properties of BiFeO 3 Thin Films On LaNiO3/Si Substrates Via Laser Ablation. 2014.
تحذير: قد لا تكون هذه الاستشهادات دائما دقيقة بنسبة 100%.