Li, C., Leong, W., Loh, K., & CHEMISTRY. (2014). Deposition of osmium and ruthenium thin films from organometallic cluster precursors.
Chicago Style CitationLi, C., W.K Leong, K.P Loh, and CHEMISTRY. Deposition of Osmium and Ruthenium Thin Films From Organometallic Cluster Precursors. 2014.
MLA引文Li, C., W.K Leong, K.P Loh, and CHEMISTRY. Deposition of Osmium and Ruthenium Thin Films From Organometallic Cluster Precursors. 2014.
警告:這些引文格式不一定是100%准確.