Li, C., Leong, W., Loh, K., & CHEMISTRY. (2014). Deposition of osmium and ruthenium thin films from organometallic cluster precursors.
استشهاد بنمط شيكاغوLi, C., W.K Leong, K.P Loh, و CHEMISTRY. Deposition of Osmium and Ruthenium Thin Films From Organometallic Cluster Precursors. 2014.
MLA استشهادLi, C., W.K Leong, K.P Loh, و CHEMISTRY. Deposition of Osmium and Ruthenium Thin Films From Organometallic Cluster Precursors. 2014.
تحذير: قد لا تكون هذه الاستشهادات دائما دقيقة بنسبة 100%.