發送短信

數:

提供者:

CAPTCHA:

  ____     _    _    __   _      ___      ______  
 |  _ \\  | || | || | || | ||   / _ \\   /_____// 
 | |_| || | || | || | '--' ||  / //\ \\  `____ `  
 | .  //  | \\_/ || | .--. || |  ___  || /___//   
 |_|\_\\   \____//  |_|| |_|| |_||  |_|| `__ `    
 `-` --`    `---`   `-`  `-`  `-`   `-`  /_//     
                                         `-`

Please enter what you see:

發送短信 : Comparative analysis and study of ionized metal plasma (IMP)-Cu and chemical vapor deposition (CVD)-Cu on diffusion barrier properties of IMP-TaN on SiO2