APA Citation

Latt, K., Sher-Yi, C., Osipowicz, T., Lee, K., Lee, Y., & PHYSICS. (2014). Comparative study of copper films prepared by ionized metal plasma sputtering and chemical vapor deposition in the Cu/TaN/SiO2/Si multilayer structure.

Chicago Style Citation

Latt, K.M., C. Sher-Yi, T. Osipowicz, K. Lee, Y.K Lee, and PHYSICS. Comparative Study of Copper Films Prepared By Ionized Metal Plasma Sputtering and Chemical Vapor Deposition in the Cu/TaN/SiO2/Si Multilayer Structure. 2014.

MLA Citation

Latt, K.M., et al. Comparative Study of Copper Films Prepared By Ionized Metal Plasma Sputtering and Chemical Vapor Deposition in the Cu/TaN/SiO2/Si Multilayer Structure. 2014.

Warning: These citations may not always be 100% accurate.