Evaluation of back-side secondary ion mass spectrometry for boron diffusion in silicon and silicon-on-insulator substrates
10.1063/1.1782959
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sg-nus-scholar.10635-965262023-10-31T20:24:18Z Evaluation of back-side secondary ion mass spectrometry for boron diffusion in silicon and silicon-on-insulator substrates Yeo, K.L. Wee, A.T.S. Chong, Y.F. PHYSICS 10.1063/1.1782959 Journal of Applied Physics 96 7 3692-3695 JAPIA 2014-10-16T09:24:27Z 2014-10-16T09:24:27Z 2004-10-01 Article Yeo, K.L., Wee, A.T.S., Chong, Y.F. (2004-10-01). Evaluation of back-side secondary ion mass spectrometry for boron diffusion in silicon and silicon-on-insulator substrates. Journal of Applied Physics 96 (7) : 3692-3695. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1782959 00218979 http://scholarbank.nus.edu.sg/handle/10635/96526 000224145800014 Scopus |
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PHYSICS |
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PHYSICS Yeo, K.L. Wee, A.T.S. Chong, Y.F. |
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Yeo, K.L. Wee, A.T.S. Chong, Y.F. |
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Yeo, K.L. Wee, A.T.S. Chong, Y.F. Evaluation of back-side secondary ion mass spectrometry for boron diffusion in silicon and silicon-on-insulator substrates |
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Yeo, K.L. |
title |
Evaluation of back-side secondary ion mass spectrometry for boron diffusion in silicon and silicon-on-insulator substrates |
title_short |
Evaluation of back-side secondary ion mass spectrometry for boron diffusion in silicon and silicon-on-insulator substrates |
title_full |
Evaluation of back-side secondary ion mass spectrometry for boron diffusion in silicon and silicon-on-insulator substrates |
title_fullStr |
Evaluation of back-side secondary ion mass spectrometry for boron diffusion in silicon and silicon-on-insulator substrates |
title_full_unstemmed |
Evaluation of back-side secondary ion mass spectrometry for boron diffusion in silicon and silicon-on-insulator substrates |
title_sort |
evaluation of back-side secondary ion mass spectrometry for boron diffusion in silicon and silicon-on-insulator substrates |
publishDate |
2014 |
url |
http://scholarbank.nus.edu.sg/handle/10635/96526 |
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1781786483166806016 |