APA引文

Lee, Y., Latt, K., Osipowicz, T., Sher-Yi, C., & PHYSICS. (2014). Study of diffusion barrier properties of ternary alloy (TixAlyNz) in Cu/TixAlyNz/SiO2/Si thin film structure.

Chicago Style Citation

Lee, Y.K., K.M Latt, T. Osipowicz, C. Sher-Yi, and PHYSICS. Study of Diffusion Barrier Properties of Ternary Alloy (TixAlyNz) in Cu/TixAlyNz/SiO2/Si Thin Film Structure. 2014.

MLA引文

Lee, Y.K., et al. Study of Diffusion Barrier Properties of Ternary Alloy (TixAlyNz) in Cu/TixAlyNz/SiO2/Si Thin Film Structure. 2014.