D., B., P., J., S., I., & D., B. (2017). Qualifying ultrathin alumina film prepared by plasma-enhance atomic layer deposition under low temperature operation.
Chicago Style CitationD., Bootkul, Jitsopakul P., Intarasiri S., and Boonyawan D. Qualifying Ultrathin Alumina Film Prepared By Plasma-enhance Atomic Layer Deposition Under Low Temperature Operation. 2017.
MLA引文D., Bootkul, Jitsopakul P., Intarasiri S., and Boonyawan D. Qualifying Ultrathin Alumina Film Prepared By Plasma-enhance Atomic Layer Deposition Under Low Temperature Operation. 2017.
警告：這些引文格式不一定是100％准確.