D., B., P., J., S., I., & D., B. (2017). Qualifying ultrathin alumina film prepared by plasma-enhance atomic layer deposition under low temperature operation.
استشهاد بنمط شيكاغوD., Bootkul, Jitsopakul P., Intarasiri S., و Boonyawan D. Qualifying Ultrathin Alumina Film Prepared By Plasma-enhance Atomic Layer Deposition Under Low Temperature Operation. 2017.
MLA استشهادD., Bootkul, Jitsopakul P., Intarasiri S., و Boonyawan D. Qualifying Ultrathin Alumina Film Prepared By Plasma-enhance Atomic Layer Deposition Under Low Temperature Operation. 2017.
تحذير: قد لا تكون هذه الاستشهادات دائما دقيقة بنسبة 100%.