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استشهاد بنمط شيكاغوP., Premphet, Prasoetsri M., Boonyawan D., Supruangnet R., Udomsom S., و Leksakul K. Optimization of DC Magnetron Sputtering Deposition Process and Surface Properties of HA-TiO<inf>2</inf> Film. 2017.
MLA استشهادP., Premphet, et al. Optimization of DC Magnetron Sputtering Deposition Process and Surface Properties of HA-TiO<inf>2</inf> Film. 2017.
تحذير: قد لا تكون هذه الاستشهادات دائما دقيقة بنسبة 100%.