APA引文

Dechana, A., Thamboon, P., & Boonyawan, D. (2018). Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber.

Chicago Style Citation

Dechana, A., P. Thamboon, and D. Boonyawan. Microwave Remote Plasma Enhanced-atomic Layer Deposition System With Multicusp Confinement Chamber. 2018.

MLA引文

Dechana, A., P. Thamboon, and D. Boonyawan. Microwave Remote Plasma Enhanced-atomic Layer Deposition System With Multicusp Confinement Chamber. 2018.

警告：這些引文格式不一定是100％准確.