APA引文

Puttaraksa, N., Norarat, R., Laitinen, M., Sajavaara, T., Singkarat, S., & Whitlow, H. J. (2018). Lithography exposure characteristics of poly(methyl methacrylate) (PMMA) for carbon, helium and hydrogen ions.

Chicago Style Citation

Puttaraksa, Nitipon, Rattanaporn Norarat, Mikko Laitinen, Timo Sajavaara, Somsorn Singkarat, and Harry J. Whitlow. Lithography Exposure Characteristics of Poly(methyl Methacrylate) (PMMA) for Carbon, Helium and Hydrogen Ions. 2018.

MLA引文

Puttaraksa, Nitipon, et al. Lithography Exposure Characteristics of Poly(methyl Methacrylate) (PMMA) for Carbon, Helium and Hydrogen Ions. 2018.