Puttaraksa, N., Norarat, R., Laitinen, M., Sajavaara, T., Singkarat, S., & Whitlow, H. J. (2018). Lithography exposure characteristics of poly(methyl methacrylate) (PMMA) for carbon, helium and hydrogen ions.

Puttaraksa, Nitipon, Rattanaporn Norarat, Mikko Laitinen, Timo Sajavaara, Somsorn Singkarat, و Harry J. Whitlow. Lithography Exposure Characteristics of Poly(methyl Methacrylate) (PMMA) for Carbon, Helium and Hydrogen Ions. 2018.

Puttaraksa, Nitipon, et al. Lithography Exposure Characteristics of Poly(methyl Methacrylate) (PMMA) for Carbon, Helium and Hydrogen Ions. 2018.