Siwarakrangsun, N., Atthi, N., Porntheeraphat, S., Jantawong, J., Leksakul, K., & Poyai, A. (2018). Fabrication of multi-level photoresist patterns in one-step lithography by using Cr/Ni multi-film thickness mask.
Chicago Style CitationSiwarakrangsun, Narongchai, Nithi Atthi, Supanit Porntheeraphat, Jirawat Jantawong, Komgrit Leksakul, and Amporn Poyai. Fabrication of Multi-level Photoresist Patterns in One-step Lithography By Using Cr/Ni Multi-film Thickness Mask. 2018.
MLA CitationSiwarakrangsun, Narongchai, et al. Fabrication of Multi-level Photoresist Patterns in One-step Lithography By Using Cr/Ni Multi-film Thickness Mask. 2018.
Warning: These citations may not always be 100% accurate.